|
|
1200 DWDM

|
1200 PCS

|
900 PCS

|
MC 370

|
| Chamber Volume |
l |
1830 |
1830 |
705 |
374 |
|
| Substrate
Heating |
C |
400 |
400 |
400 |
400 |
| Substrate Carrier
|
|
Wafer |
Dome |
Dome |
Dome |
| Pump
System |
. |
. |
. |
. |
. |
. |
. |
| Rotary (double
stage) |
m3/h |
175 |
175 |
80 |
30 |
| Roots |
m3/h |
1200 |
1200 |
500 |
|
|
| Diffusion
|
l/s |
20000 |
20000 |
11500 |
1500 |
| Baffle |
mm |
630 |
630 |
500 |
|
| Time to Vac. to 1x10-6
mbar |
min |
12 |
12 |
12 |
10 |
|
| Components |
. |
. |
. |
. |
. |
. |
. |
| Plasma Deposition Source |
PDS |
Yes |
Optional |
Optional |
Optional |
| Rate Monitor |
Inficon |
IC/5 |
IC/5 |
IC/5 |
IC/5 |
| Optical Monitor |
IOM |
Yes |
Optional |
Optional |
Optional |
| RGA |
Transpector |
Optional |
Optional |
Optional |
Optional |
| Control System |
Version |
Artisan |
Artisan |
Artisan |
Artisan |
| Polycold |
type |
CC11S |
CC11S |
CC11S |
CC4S |
Glow Discharge is optional |
| Evaporation Options |
. |
. |
. |
. |
. |
. |
. |
| No of Sources |
pcs |
3 |
4 |
3 |
2 |
|
|
| EB Guns |
. |
. |
. |
. |
. |
. |
. |
| Power |
kW |
15 |
15 |
15 |
6 |
|
|
| High Voltage
range |
kV |
6-10 |
6-10 |
6-10 |
3-7 |
|
|