Satis RTC Photonics Systems has developed a compact retrofitable high-energy plasma source for use in conjunction with thermal or electron-beam evaporation.

The Satis RTC Plasma Deposition Source - PDS - is capable of modifying the growing thin film's microstructure to produce dense, near stoichiometric coatings that are impervious to temperature and humidity variations. The refractive indices achieved are near those of bulk materials.

Unlike ion-assisted processes, PDS enables higher deposition rates with coverage over the entire workholder.

PDS is a flexible and powerful system ideal for retrofitting into existing coating systems or installing in new equipment. Its operation can be integrated into process controllers, such as Artisan, for automatic thin film deposition control.

• Automatic feedback from heater power to control plasma characteristics
• Compact low-profile design
• Flexibility
• High conversion efficiency: plasma energy closely related to bias voltage
• Inductive heating of cathode (electron emitter)
• Long lifetime of cathode, ceramics and anodes mean low running costs
• Modifiable plasma distribution profile to match plant configuration
• Retrofittable
• Water-cooling allows use with temperature sensitive substrates

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Contact details:

Satis RTC Photonics Systems
Turnpike Farm
Potton Road
Biggleswade
Bedfordshire
SG18 0EP
England

Tel. + 44 (0)1767 313067
Fax.+ 44 (0)1767 600331

Eml. sales@satisrtc.com

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This page last updated on November 23rd. 2000 and is © Satis Photonics RTC Systems Y2000

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